cz115 copper target

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CZ115 | Columbia Metals

14  · CZ115 (CW722R) CZ115 (CW722R) is a duplex high tensile brass with a restricted aluminium content to facilitate soldering and brazing. Sometimes referred to as a

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CZ115 / CW722R - High Tensile Brass | Holme Dodsworth M…CZ115 | CW722RCZ112 / CW712R - Naval Brass | Holme Dodsworth Metals LtdDATASHEET CZ121 (CW614N) - Thames StockBS 2874 CZ114 | CuZn38Sn1 |Naval Brass - Copper Alloys•

CZ115 / CW722R - High Tensile Brass | Holme Dodsworth

CZ115 / CW722R consists of of a duplex structure and is a high tensile brass with a restricted aluminium content, enabling it to be soldered and brazed. Similar in

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Copper: 56.5-58.5% [PDF]

Related Specifications Chemical Composition Mechanical

202123 · CZ115 is a duplex high tensile brass with a restricted aluminium content to enable it to be soldering and brazing. Similar in composition to the CW721 / CZ114 grade

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CZ115 | CW722R

2022222 · CZ115 is similar in composition to CZ114 but with restricted aluminium content - this makes the alloy more suitable for applications where high strength brass

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CZ115-_

2020110 · CZ115 : 。 (copperalloy)。

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Super-roughening type adhesion enhancement

This organic acid-type microetching solution creates a super-roughened copper surface. The uniquely-roughened copper surface topography helps to achieve high copper-to-resin

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CZ112 | Columbia Metals

CZ112 (CW712R) CZ112 (CW712R) is commonly referred to as naval brass due its corrosion resistance in seawater and other mildly aggressive environments. The alloy

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CZ115

20221228 · CZ115. CZ114 is a type of High Tensile Brass with higher percentage of Aluminum and finds its application where strength and Corrosion resistance are required.

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CW722R(CZ115)_

202186 · CZ115CZ114 ,——,。

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CZ115-()

2022928 · CZ115 :180 : 10 : : 17:34:02 : :608 qq:

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Microstructures of some high tensile brasses: Materials

198952 · The microstructures of extruded high tensile brasses with compositions conforming to BS 2872/4 CZ114, CZ115, and CZ116 consist of copper rich fcc α-phase, ordered B2 β′-phase, and some iron rich pa...

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XRD pattern of a pure Cu target | Download Scientific

XRD pattern in Fig. 2 of the Cu target represents three characteristics peaks observed at 43.8°, 50.9° and 74.6° that referred to (111), (200) and (220) planes of Cu, respectively. These planes ...

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Copper (Cu) Sputtering Targets - Kurt J. Lesker Company

Copper (Cu) General Information. Copper is one of the most highly utilized elements in the world with evidence of its usage found during ancient times. It is reddish-orange in color with a melting point of 1,083°C, a density of 8.92 g/cc, and a vapor pressure of 10 -4 Torr at 1,017°C. Two of the most popular alloys in the world, brass and ...

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Copper Targets |

Copper. Copper is used for a variety of thin film applications including as a conductor material in logic and memory devices. Tosoh offers Copper targets for all major OEM PVD systems. Targets for all wafer sizes can be made in purities ranging from 4N to 6N. Through control of the target metallurgy, surface finish and assembly technology ...

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99.99% Cu Target -

Cu target 99.99%MAT-CN() 8.96g/cm ³ 1084℃ 99.99% >99% 3.2Ra ±0.1mm Cu MAT-CN

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CZ115-_

2020110 · CZ115 : 。 (copperalloy)。﹐。8.96﹐1083℃﹐﹑﹑ ...

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2016130 · 0003,Te:0.0002,Mn:0.00005,Cd:0.0001 C10200 99.95 0.001TU1、 TU2 C12000 99.90 0.004-0.012 TP1C12200 99.90 0.015-0.040 TP2-- 、 Cu Pb

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Copper target for sputter deposition - Applied Materials, Inc.

1999318 · The copper target of claim 1 further characterized by a purity level between 99.995% and 99.9999% and at least one of: an antimony, an arsenic and a bismuth content each of less than 0.03 ppm; a hydrogen content of less than 1.0 ppm; an oxygen content of less than 1.0 ppm; and. a sulfur content of less than 0.05 ppm.

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Copper-Nickel Alloys - ROLEX ALLOYS INTERNATIONAL

2021819 · This specification establishes the requirements for copper-nickel-zinc and copper-nickel rod and bar for general application produced from Copper Alloy UNS Nos. C70600, C70620, C71500, C71520, C74500, C75200, C75700, C76400, C77000, and C79200. Copper Alloys UNS Nos. C70620 and C71520 are for product intended for

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CZ115 / CW722R Extruded High Tensile Brass (Restricted Al)

2020221 · CZ115 / CW722R Extruded High Tensile Brass (Restricted Al) consists of of a duplex structure and is a high tensile brass with a restricted aluminium content, enabling it to be soldered and brazed. Similar in composition to the CW721 / CZ114 (aluminium content aside) this grade it was developed to allow high strength brass components to be

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[PDF]

Sputtering Targets for Semiconductor Applications

2018125 · Target size and microstructure are designed to serve the latest sputtering equipment for 300 mm wafer technology. Our international sales network ensures close ... Copper Cu 4N5 (99.995%) 12 mm bonded on cooling plate Chromium Cr 3N5 (99.95%) 12 mm bonded on cooling plate ...

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XRD pattern of a pure Cu target | Download Scientific

XRD pattern in Fig. 2 of the Cu target represents three characteristics peaks observed at 43.8°, 50.9° and 74.6° that referred to (111), (200) and (220) planes of Cu, respectively. These planes ...

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Choice of X-ray Target - University College

Choice of X-ray Target. The wavelength, λ, of the characteristic line giving rise to a particular transition is given by Moseley's Law: 1 / λ = c (Z - σ) 2 where c and σ are constants, and Z is the atomic number of the metal

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Copper Targets |

Copper. Copper is used for a variety of thin film applications including as a conductor material in logic and memory devices. Tosoh offers Copper targets for all major OEM PVD systems. Targets for all wafer sizes can be made in purities ranging from 4N to 6N. Through control of the target metallurgy, surface finish and assembly technology ...

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Sputtering Target (PVD) for Semiconductor - JX Metals

Our Cu target, with 6N (99.9999% or above) purity, was specially developed to reduce particulate matter during sputtering. JX NMM encompasses the entire supply chain, from resource extraction, smelting and refining to target manufacturing, enabling reliable supply of our world-standard 6N target.

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CZ115-_

2020110 · CZ115 : 。 (copperalloy)。﹐。8.96﹐1083℃﹐﹑﹑ ...

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Technical Specification - Gold Metal Extrusion

We are specialized in Copper Alloys Extrusion, a comprehensive list of the products manufacture by us is mentioned below: Free Cutting Brass: IS-319 GR.I / GR.II: Alloy C360: EN 12167 CW614N: ... BS2874 CZ114 & CZ115: AS-2738 C68600: UNS C68600: Application : Pump Rods & Shafts, Valves, ...

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Copper Sputtering Target, Cu Supplier

Chemical Formula: Cu Catalog Number: ST0011 CAS Number: Purity: 99.9%, 99.99%, 99.999% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made Copper sputtering target is available in

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EN .doc-

2021126 · CW113C Copper-lead Leaded copper C18700 CuZn5 CZ125 CW500L Cap copper 95/5 brass C21000 CuZn10 CZ101 CW501L Gilding metal, 90/10 90/10 brass,commercial ‘bronze’ C22000 CuZn15 CZ102 CW502L Gilding metal, 85/15 85/15 brass, red brass C23000 CuZn20

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CZ115 :: Rajhans Metals

2022119 · CZ115 is a duplex high tensile brass with a restricted aluminium content to facilitate soldering and brazing. Sometimes referred to as a manganese bronze, CZ115 has additions of iron, tin and manganese that benefit the physical and mechanical attributes of the alloy. CHEMICAL COMPOSITION. Elements: Min (%) Max (%) Cu: 56.50: 58.50: Pb:

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Choice of X-ray Target - University College

Choice of X-ray Target. The wavelength, λ, of the characteristic line giving rise to a particular transition is given by Moseley's Law: 1 / λ = c (Z - σ) 2 where c and σ are constants, and Z is the atomic number of the metal

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Why is Cu target always used in XRD analysis?. Why not

202258 · Again as like mentioned by others, the fluorescence effect plays a role when a copper target is used for iron (Fe) and Manganeese(Mn) containing materials. In order to avoid that, a Co target is ...

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. CA101、CA102、CA103、CA104、CA105. CuAl5As、CuAl8、CuAl9Mn2、CuAl8Fe3、CuAl10Fe3Mn2、CuAl10Ni5Fe4、CuAl11Ni6Fe5. :. QBe2、QBe1.9、QBe1.9-0.1、QBe1.7、QBe0.6-2.5、QBe0.4-1.8、QBe0.3-1.5. :. HAl77-2、HAl60-1-1、HAl59-3-2、HAl66-6-2、HAl67-2.5、HAl61-4-3-1、. C3560 ...

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The dependence of target voltage on target

Copper target was sputtered in the argon atmosphere. The examined power ranged from 0.5 to 4.5 kW which gave an average power density on target surface from 25 to 115 W/cm2.

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CZ115

20221228 · CZ115. CZ114 is a type of High Tensile Brass with higher percentage of Aluminum and finds its application where strength and Corrosion resistance are required. This grade has a poor machinability rating but is excellent for hot forgeability. ... Copper. 56.50 to 58.50%. Tin. 0.20 to 0.80%. Manganese. 0.50 to 2.00%. Aluminum. 1.5% Max.

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CZ115()_

CZ115() //,. / ...

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CZ115 / CW722R Extruded High Tensile Brass (Restricted Al)

2020221 · CZ115 / CW722R Extruded High Tensile Brass (Restricted Al) consists of of a duplex structure and is a high tensile brass with a restricted aluminium content, enabling it to be soldered and brazed. Similar in composition to the CW721 / CZ114 (aluminium content aside) this grade it was developed to allow high strength brass components to be

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CZ115()_

CZ115 ()。 ,。: ...

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CZ114 | CW721R | CZ114 Brass

2022222 · CZ114 is specifically developed for applications where higher strength and corrosion resistance is required. A Manganese Bronze? Often referred to as a manganese bronze, CZ114 has increased levels of aluminium, tin, manganese and iron content which improves the overall strength and corrosion resistance of the material.The added iron

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Copper Alloy UNS C61800 -

The mechanical properties of the UNS C61800 copper alloy are outlined in the following table. Properties. Metric. Imperial. Tensile strength. 552-586 MPa. 80100-85000 psi. Yield strength (depending on temper) 269-293 MPa.

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